MMA16

MMA16 Mask Aligner

The MMA16 Mask Aligner is a high performance Mask Aligner that has been engineered with proven components. This system is a ideal economic alternative for R&D, or limited scale, pilot production. We are utilizing an innovative system, the substrate is leveled quickly and gently, for parallel photo mask alignment and uniform contact across the wafer during contact exposure. The system is capable of one micron resolution and alignment precision.

Built on an anti-vibration table, the fixed mask holder assembly virtually guarantees alignment accuracy and repeatability. Using the MMA16 Mask Aligner is a simple process, as all functions are controlled via the easy to read LCD screens. An operator can be trained on the Model MMA16 in a very short time and effectively learn to  operate the tool in under one hour. MMA16 presents cost-effective solution for alignment of small wafers/substrates. The system offers the operator a larger field of view, and an easy, simultaneous alignment of mask and wafer also at the wafer edge. System with CCD camera combined with the Split field Microscope it offers highest alignment accuracy and enables a precise alignment check.